Etching Diamond Nanostructures: A masking mechanism McKenzie, Warren Richard en_US Munroe, Paul en_US 2021-11-25T16:35:01Z 2021-11-25T16:35:01Z 2010 en_US
dc.description.abstract An analytical transmission and electron microscope study of diamond structures created using a Focused Ion Beam Hard Mask (FIBHM) technique is presented. From our findings we propose a novel hard mask mechanism for the patterning diamond which represents a new form of ion beam lithography. It involves a surface modification induced by a FIB implantation which, on exposure to a plasma etch, leads to the formation of a non-volatile platform on which components in the plasma can deposit to subsequently protect the underlying or unmasked material from etching in the same plasma environment. We show this mechanism describes the formation of diamond nano-whiskers being used for field emitters and biosensors. We also predict that it is effective for patterning silicon and explains similar masking behavior observed in the literature. en_US
dc.language English
dc.language.iso EN en_US
dc.rights CC BY-NC-ND 3.0 en_US
dc.rights.uri en_US
dc.source Legacy MARC en_US
dc.subject.other TEM en_US
dc.subject.other diamond en_US
dc.subject.other lithography en_US
dc.subject.other focussed ion beam en_US
dc.subject.other hard mask en_US
dc.title Etching Diamond Nanostructures: A masking mechanism en_US
dc.type Journal Article en
dcterms.accessRights open access
dspace.entity.type Publication en_US
unsw.description.publisherStatement This is a preprint of an article accepted for publication in Advanced Materials, copyright 2010, Wiley. Journal homepage: en_US
unsw.relation.faculty Science
unsw.relation.ispartofjournal Advanced Materials en_US
unsw.relation.originalPublicationAffiliation McKenzie, Warren Richard, Electron Microscope Unit, Faculty of Science, UNSW en_US
unsw.relation.originalPublicationAffiliation Munroe, Paul, Electron Microscope Unit, Faculty of Science, UNSW en_US
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