A direct-write, resistless hard mask for rapid nanoscale patterning of diamond McKenzie, Warren Richard en_US Cross, Graham en_US Pethica, John en_US 2021-11-25T16:35:25Z 2021-11-25T16:35:25Z 2010 en_US
dc.description.abstract We introduce a simple, resist-free dry etch mask for producing patterns in diamond, both bulk and thin deposited films. Direct gallium ion beam exposure of the native diamond surface to doses as low as 1015 cm-2 forms a top surface hard mask resistant to both oxygen plasma chemical dry etching and, unexpectedly, argon plasma physical dry etching. Gallium implant hard masks of nominal 50 nm thickness demonstrate oxygen plasma etch resistance to over 450 nm depth, or 9:1 selectivity. The process offers significant advantages over direct ion milling of diamond including increased throughput due to separation of patterning and material removal steps, allowing both nanoscale patterning resolution as well as rapid masking of areas approaching millimeter scales. Retention of diamond properties in nanostructures formed by the technique is demonstrated by fabrication of specially shaped nanoindenter tips that can perform imprint pattern transfer at over 14 GPa pressure into gold and silicon surfaces. This resistless technique can be applied to curved and non-planar surfaces for a variety of potential applications requiring high resolution structuring of diamond coatings. en_US
dc.identifier.issn 0925-9635 en_US
dc.language English
dc.language.iso EN en_US
dc.rights CC BY-NC-ND 3.0 en_US
dc.rights.uri en_US
dc.source Legacy MARC en_US
dc.subject.other Hard mask. en_US
dc.subject.other Diamond. en_US
dc.subject.other FIB. en_US
dc.title A direct-write, resistless hard mask for rapid nanoscale patterning of diamond en_US
dc.type Journal Article en
dcterms.accessRights open access
dspace.entity.type Publication en_US
unsw.description.publisherStatement Published by Elsevier Science. Journal homepage: en_US
unsw.relation.faculty Other UNSW
unsw.relation.ispartofjournal Diamond and Related Materials en_US
unsw.relation.originalPublicationAffiliation McKenzie, Warren Richard, UNSW Analytical Centre, UNSW en_US
unsw.relation.originalPublicationAffiliation Cross, Graham, CRANN, Trinity College Dublin en_US
unsw.relation.originalPublicationAffiliation Pethica, John, CRANN, Trinity College Dublin en_US Mark Wainwright Analytical Centre *
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