Fabrication of integrated lens pair test device

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Abstract
A silica microlens has been proposed which can be integrated with planar optical waveguide circuits. In order to fabricate the microlens, two deep silica etches must be performed. RIE is the prefered process as under certain conditions it is anisotropic. This paper reports on a study of different masking materials and plasma etch conditions trialed for the deep silica etch.
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Author(s)
Kwok, Chee
Mackenzie, Mark
Peng, Gang-Ding
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Publication Year
2004
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Conference Paper
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UNSW Faculty
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download 2005-SPIE-5649-Mark.pdf 578.62 KB Adobe Portable Document Format
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