Focused Ion Beam as a direct-write mask tool for patterning diamond

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Abstract
A new technique for the nano-scaled patterning diamond is presented, the Focused Ion Beam Hard Mask (FIBHM). This process involves an exposure of a diamond surface to a Ga Focused Ion Beam which locally creates a hard mask to a plasma etch of the surrounding diamond. The first patterns created using this technique are shown including lithographic line structures 30nm in width.
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Author(s)
McKenzie, Warren Richard
Pethica, John
Cross, Graham
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Publication Year
2009
Resource Type
Conference Paper
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UNSW Faculty