Focused Ion Beam as a direct-write mask tool for patterning diamond

Abstract

A new technique for the nano-scaled patterning diamond is presented, the Focused Ion Beam Hard Mask (FIBHM). This process involves an exposure of a diamond surface to a Ga Focused Ion Beam which locally creates a hard mask to a plasma etch of the surrounding diamond. The first patterns created using this technique are shown including lithographic line structures 30nm in width.